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iƒ‹[ƒgƒtƒHƒ‹ƒ_j > ‹³ˆõ‘—— > •ŸˆäH‹Æ‚“™ê–åŠwZ‹³ˆõ‘——
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ƒtƒŠƒKƒi ƒjƒVƒm@ƒWƒ…ƒ“ƒCƒ`
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e-mail nishino—fukui-nct.ac.jp
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ŠwˆÊ 1996”Ni•½08j03ŒŽ ”ŽŽmiHŠwj@’·‰ª‹Zp‰ÈŠw‘åŠw
ŠwˆÊ˜_•¶ ‹à‘®ö‘Ì‚ð—p‚¢‚½‘å‹Cˆ³CVD–@‚É‚æ‚éŽ_‰»•¨“§–¾“±“d–Œ‚̍‡¬‚ÉŠÖ‚·‚éŠî‘b“IŒ¤‹†
Šw‹¦‰ï“™ (ŽÐ)“d‹C‰»Šw‰ïC(ŽÐ)“ú–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰ïC(ŽÐ)•\–Ê‹Zp‹¦‰ï
’˜‘˜_•¶ u‰»Šw‚Ì”àv@ŠÛŽRˆê“TC¼–쏃ˆêC“V–ì—́C¼Œ´_CŽR“c–¾•¶C¬—э‚b@(‚Q‚O‚O‚O)@’©‘q‘“X
1992”Ni•½4j Preparation of Aluminum-Doped Zinc Oxide Films by a Normal Pressure CVD Method, J. Am. Ceram. Soc., 75[12], 3469 (1992).
1997”Ni•½9j Conductive indium-doped zinc oxide films prepared by atmospheric-pressure chemical vapor deposition, J. Mater. Sci., 16, 629 (1997).
1999”Ni•½11j Electrodeposition method for controlled formation of CdS films from aqueous solutions, J. Electroanal. Chem., 473, 217 (.1999).
1999”Ni•½11j Effect of Irradiation on Preparation of CdS Films from Aqueous Solution by Electrodeposition Method, Electrochemistry, 67[12], 1141-1143 (1999).
2003”Ni•½15j Preparation of TiO<sub>2</sub> Coated Al<sub>2</sub>O<sub>3</sub> Membrane by a Pyrolysis Method, J. Mater. Sci. Lett., 22, 1007-1009 (2003).
2003”Ni•½15j Preparation of ZnO by a nearby vaporizing CVD method, J. Mater. Res., 18[9], 2029-2032 (2003).
2004”Ni•½16j Preparation of TiO<sub>2</sub> by a nearby vaporization chemical vapor deposition method, J. Mater. Sci., 39[11], 3813-3816 (2004).
2004”Ni•½16j An influence of copper particle size on the morphology of silver tree formed from AgNO<sub>3</sub> aqueous solution, Electrochemistry, 72 [11], 743-746 (2004).
2004”Ni•½16j Low temperature preparation of ZnO by a nearby vaporizing Chemical Vapor Deposition method, J. Cryst. Growth, 268[1-2], 174-177 (2004).
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